Tutorials
Two full-day and four half-day tutorials will be presented in four parallel sessions on January 23, 2007. The tutorials are given by top experts in the fields and cover today's most important issues in system LSI design and EDA technologies : DFM, functional verification, low power, physical synthesis and embedded system design.
- Date: Tuesday, January 23, 2007 (9:30 - 17:00)
- Place: Pacifico Yokohama, Conference Center, 4F
Time | Title | ||
Tutorial 1 (Full Day) | 9.30 - 17.00 | DFM Tools and Methodologies at 65nm and Beyond | |
Tutorial 2 (Full Day) | 9.30 - 17.00 | Functional Verification Planning and Management - The Road to Verification Closure is Paved with Good Intentions | |
Tutorial 3 (Half Day) | 9.30 - 12.30 | Low Power CMOS Design: The Fabrics: Research Front-End |
|
Tutorial 4 (Half Day) | 14.00 - 17.00 | Low Power CMOS Design: The Applications: State-of-the-Art Practice |
|
Tutorial 5 (Half Day) | 9.30 - 12.30 | Fast Physical Synthesis for Multi-Million Gate ASIC Designs | |
Tutorial 6 (Half Day) | 14.00 - 17.00 | Concepts and Tools for Practical Embedded System Design |
- Chair: Makoto Ikeda (Univ. of Tokyo)
Tutorial 1 (Full Day), Tuesday, January 23, 9.30 - 17.00 (Room 411+412)
DFM Tools and Methodologies for 65nm and Below
Organizer:
Andrew B. Kahng - Univ. of California, San Diego and Blaze DFM, Inc., United States
Speakers:
N. S. Nagaraj - Texas Instruments, United States
Jean-Pierre Schoellkopf - STMicroelectronics, France
Mike Smayling - Applied Materials, United States
Ban P. Wong - Charterd Semiconductor, United States
Andrew B. Kahng - Univ. of California, San Diego and Blaze DFM, Inc., United States
Abstract:
Entering the 65nm node, today's DFM tools attempt to satisfy
several basic objectives. To address the failure of "WYSIWYG"
in sub-100nm process nodes, "shape" (x-y dimension)
and "thickness" (z dimension) simulation technologies are being
deployed. To address "uncontrollable variation", statistical
analysis technologies (SSTA, statistical extraction, etc.) are
being investigated. And, well-established internal technologies
for defect-oriented yield analysis (critical area, pattern
hotspot finding) and optimization (via/contact doubling, wire
spreading, etc.) are being commoditized. The order of tool
deployment has been as one would expect: (1) geometric
criteria (through process window hot-spots, etc.) before electrical
criteria (leakage, timing variation, etc.); (2) library and
IP development use models before full-chip use models; and
(3) analyses before optimizations.
How are such technologies applied to ensure the fastest library and RET development, the fastest process ramps, the highest yields? This tutorial will discuss DFM technologies and methodologies that provide high-ROI bridges between designers and the manufacturing process.
Part 1: Interactions between layout and manufacturability for
devices
Part 2: Interactions between layout and manufacturability for
interconnects
Part 3: Design of test structures and test chips to characterize
FEOL and BEOL variability, and use of in-line
metrology to inform modeling and cycles of yield learning
Part 4: Current DFM tools and methodologies, along with
opportunities for improved DFM deployment
Part 5: New tools and futures
Tutorial 2 (Full Day), Tuesday, January 23, 9.30 - 17.00 (Room 413)
Functional Verification Planning and Management - The Road to Verification Closure is Paved with Good Intentions
Organizers:
Andrew Piziali - Cadence, United States
Avi Ziv - IBM, Israel
Speakers:
Andrew Piziali - Cadence, United States
Avi Ziv - IBM, Israel
Abstract:
This tutorial teaches the student state-of-the-art techniques
and methodologies that are used in the industry today
for planning, monitoring and assessing verification progress.
Planning, monitoring and assessment of the verification process
are essential for predictable, successful verification.
Quantifying the scope of the verification problem, specifying
its solution and measuring verification progress against
this plan dramatically reduces schedule uncertainty and provides
an adaptive framework for accommodating design and
schedule changes. This planning process provides the information
necessary to predict the state of the verification process
for risk analysis and management. Overall, good planning,
monitoring and assessment prevent late schedule and
quality surprises.
Tutorial 3 (Half Day), Tuesday, January 23, 9.30 - 12.30 (Room 414+415)
Low Power CMOS Design:
The Fabrics: Research Front-End
Organizer:
Tadahiro Kuroda - Keio University, Japan
Speakers:
Hitoshi Wakabayashi - Sony, Japan
Tadahiro Kuroda - Keio University, Japan
Ankur Gupta - Cadence, United States
Luca Benini - Bologna University, Italy
Abstract:
This tutorial will cover research front-ends of low power
CMOS design, including (1) process and device level, (2) circuit
level, (3) EDA level, and (4) system level.
Tutorial 4 (Half Day), Tuesday, January 23, 14.00 - 17.00 (Room 414+415)
Low Power CMOS Design:
The Applications: State-of-the-Art Practice
Organizer:
Tadahiro Kuroda - Keio University, Japan
Speakers:
Toshihiro Hattori - Renesas, Japan
Atsuki Inoue - Fujitsu Laboratory, Japan
Masaya Sumita - Panasonic, Japan
Mototsugu Hamada - Toshiba, Japan
Abstract:
This tutorial will cover state-of-the-art practice of low power
CMOS designs in various application fields, including (1) application
processors, (2) ASICs, (3) digital consumer products,
and (4) wireless communication chips.
Tutorial 5 (Half Day), Tuesday, January 23, 9.30 - 12.30 (Room 416+417)
Fast Physical Synthesis for Multi-Million Gate ASIC Designs
Organizer:
Charles J. Alpert - IBM, United States
Speakers:
Charles J. Alpert - IBM, United States
Abstract:
This tutorial presents new physical synthesis techniques
that are designed to improve throughput. This tutorial discusses:
- Placement techniques: The tutorial discusses new approaches that make placement fast (such as multilevel clustering) and also modern force-directed placement techniques that have recently proven superior for obtaining high quality placements. The tutorial will also discuss the placement of multi-cycle latches.
- Innovative buffering techniques: The tutorial discusses new techniques for inserting buffers quickly (compared to traditional van Ginneken) and how to also handle modern routing congestion constraints.
- Legalization paradigm shift: This tutorial discusses a technique called diffusion that smoothly spreads out cells to handle these difficult legalization instances.
- The optimization model: No matter what kind of change is required, whether synthesis, repowering or buffering is required, the tool needs a mechanism to evaluate the change and then either accept or reject the solution, via an incremental static timing analysis tool. The tutorial will briefly cover this optimization model.
- Putting it all together: All the pieces still need to be assemble into a coherent physical synthesis flow. The tutorial presents ways to combine the techniques of electrical correction, critical path optimization, histogram compression, wirelength reduction, and area recovery into a coherent flow that can be used for timing closure. Insights into design techniques and strategies for interacting with physical synthesis flows will also be discussed.
Tutorial 6 (Half Day), Tuesday, January 23, 14.00 - 17.00 (Room 416+417)
Concepts and Tools for Practical Embedded System Design
Organizer:
Nikil Dutt - Univ. of California, Irvine, United States
Speakers:
Daniel Gajski - Univ. of California, Irvine, United States
Andreas Gerstlauer - Univ. of California, Irvine, United States
Samar Abdi - Univ. of California, Irvine, United States
Abstract:
The continuous increase in size, complexity and heterogeneity
of embedded system (ES) designs has introduced
new challenges in their modeling, synthesis and verification.
The ES designs of today are being specified and developed
at higher levels of abstraction such as transaction
level to cope with their complexity. For ES implementation,
the application must be mapped to the target platform. The
higher level descriptions are then translated to platformaware
RTL/C code that can be input to standard SW and EDA tools.
All ES design descriptions also need to be verifiable to ensure
their consistency and functional correctness.
In this tutorial, we will cover the key concepts and state of the art tools for ES design using industrial strength case studies such as MP3 player design. We will have in-depth presentations on the following topics:
- Introduction and ES design requirements.
- ES programming and modeling at specification and transaction levels.
- Tools for implementation and verification of ES designs for different HW-SW platforms.
- Tools for synthesis of HW, SWand interfaces from high level ES models.
- Verification of ES designs using simulation and FPGA prototyping.
- A roadmap for establishing an ES design science and tool flow.