| Abstract | As the leading edge of technology advances into the nanometer era,
process data accuracy becomes increasingly important to the success of
product designs. The gap between theoretical benefit and benefit obtainable
by designers grows wider with each new technology node.
However, foundries and EDA tool vendors can collaborate to reclaim some of
the lost benefits of these technology nodes.
In this talk, I will discuss how foundries can contribute in the effort
to reclaim lost benefits through better model and data accuracy,
while EDA tool vendors contribute through improved design approaches.
I will give some examples of TSMC’s approaches in improving SPICE model
accuracy and DFM accuracy, as well as collaboration with EDA tool vendors
in creating our DFM Data Kit. By increasing awareness of TSMC’s approach
to this issue, I hope to stimulate discussion from all sides of the industry
in the search for more solutions. |